Cathode Sputtering in Hollow Cathode Discharges

スポンサーリンク

概要

• 論文の詳細を見る

• In order to investigate the processes responsible for a negative resistance of the hollow cathode discharge, several discharge parameters are measured with a Langmuir probe. The vapor density distributions of the sputtered cathode metal are measured by the absorption method of the resonance radiation of the metal atom. Almost all the metal atoms in the central part of the catbode space are found to be ionized or excited.

• 社団法人日本物理学会の論文
• 1962-09-05

著者

• MUSHA Toshimitsu

  Electrical Communication Laboratory

• Musha T.

  Electrical Communication Laboratory

関連論文

• Mnnte Carlo Calculations of Motion of Electrons in Helium
• Theory of Negative Resistance in Hollow Cathode Discharges
• Amplification of Waves due to Electron Streams
• Cathode Sputtering in Hollow Cathode Discharges

スポンサーリンク