Curie Temperature of Evaporated Nickel Films
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概要
- 論文の詳細を見る
Electrical resistance of nickel films of the thickness from 140 Å to 1600 Å is measured as a function of temperature, and the Curie temperature of the films is determined from a break in resistance vs temperature curve. Residual gas is found to be effective in reducing the Curie temperature of the films when the ratio of pressure to deposition rate exceeds 1x10^<-6> mmHg・Å^<-1>・sec. A slight decrease of the Curie temperature is observed as a film thickness is decreased.
- 社団法人日本物理学会の論文
- 1962-07-05
著者
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Morita Nobuyoshi
The Institute Of Physical And Chemical Research
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Morita N.
The Institute of Physical and Chemical Research
関連論文
- Curie Temperature and Lattice Constant of Evaporated Nickel Films
- Curie Temperature of Evaporated Nickel Films