Paramagnetic Centers Produced at the Silicon Surface by Heat-Treatment in Atmosphere Containing No Oxygen
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概要
- 論文の詳細を見る
- 社団法人日本物理学会の論文
- 1962-10-05
著者
-
Shoji Masakazu
Hitachi Central Re8earch Laboratory
-
KUSUMOTO Hazime
Hitachi Central Research Laboratory
関連論文
- A New Phase Appearing in Metal-Semiconductor Transition in VO_2
- Observation of Dislocations in Germanium Single Crystal
- Paramagnetic Centers Produced at the Silicon Surface by Heat-Treatment in Atmosphere Containing No Oxygen
- On the Impurity Concentration of the P-type Recrystallized Layer of Tunnel Diode
- Determination of the Impurity Concentration of the P-type Recrystallized Layer by Thermoelectric Power Measurements