Nucleation, Growth and Microstructure of Vapour Deposited Tin Film on NaCl Single Crystal Substrate

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概要

• 論文の詳細を見る

• Nucleation and growth of tin films deposited onto sodiuni chloride singlecrystal substrate were studied by transmission electron microscope by scanningthe growth of the film from 10 A to 1500 A thickness range. The substrate tempera-ture was also varied from 30'C to l25'C to study the effect of substrate tem-perature on the orientation in these films. It was observed that highly orientedfilms could be obtained by depositing films onto a heated substrate (nearly equalto 2/3 of melting point) at a relatively low deposition rate (x6 A/sec.).

• 一般社団法人日本物理学会の論文
• 1978-09-15

著者

• Malhotra G.L.

  National Physical Laboratory

関連論文

• Nucleation, Growth and Microstructure of Vapour Deposited Tin Film on NaCl Single Crystal Substrate

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