Control of Electron Temperature of a Plasma in Double Plasma Device
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概要
- 論文の詳細を見る
A ?aaethod is described for varvinn tlte electron tenarerature of a rlasnaa (tarset-plasrna) in a double plasnxa device frona 0.05 to ] .3 eV by adjtmsting the thernaionicemission of electrons from filaunents tased in the region.
- 社団法人日本物理学会の論文
- 1977-03-15
著者
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Honzawa Tadao
Department Of Electronic Engineering Utsunomiya University
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Honzawa Tadao
Department Of Electric And Electronic Engineering Utsunomiya University
関連論文
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- Effects of Space Charges in Gridded Energy Analyzer
- Loss Mechanism of Electrons from a Magnetic Bottle
- Control of Electron Temperature of a Plasma in Double Plasma Device
- Observation of Wave-Breaking into Packets in Beam-Plasma Systems
- Peculiar Modulation of Ion-Beam Pulses Observed at the Plasma Boundary
- Direct Measurements of Electrostatic Shock Potentials
- A Method for the Energy Analysis of Electrons in the Presence of Trapped Electrons
- Notable Amplification of Solitons through Reflection of Beam Ions