めっき形磁気ディスク用シリコン化合物保護膜
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概要
- 論文の詳細を見る
To develope a plated media, the feasibility of obtaining protective film materials was studied on 'three silicon compounds, sputtered Si0_2,Si_3N_4 and spincoated Si0_2. Each 80 nm thick Si compound protective film was successfully developed. Moreover, to meet requirements for higher recording density disks, materials for thinner protective film thickness were studied. Protective film performances were estimated by wear after 20000 contact-start-stop tests with a taper-fiat ferrite head, by corrosion resistance which would cause no signal error increase for 5 years under 50% R. H. and by productivity. An 80 nm protective film thickness has been chosen as a result of a compromise between wear durability and corrosion resistance, and reduction in read/write characteristics. The spincoated film w, as selected because of the good corrosion resistance and the excellent productivity. Two layer composite protective films, composed of sputtered Cr oxide and sputtered Si0_2,are feasible for higher recording density plated disks, since corrosion resistance for 30 nm composite films is better than that for 80 nm simple Si0_2 films.
- 公益社団法人精密工学会の論文
- 1983-06-05