The Mass Dependence of the Sputtering Yield : Surface Correction

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概要

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• A simple model is used to study the dependence of the sputtering yield on the incident atomic number (Z_1). Scatterings between incident and target atoms are classified into two types, that is, large and small angle scatterings. Large angle scatterings are represented by random walk with a certain energy loss and small angle scatterings by another certain energy loss without refraction. The range distribution derived from this model rather well agrees with other rigorous calculations. As for the sputtering yield, it is well known that the result of Sigmund's theory has a large overestimation from experimental data in the region where M_2 >> M_1,M_1 and M_2 the mass of incident and target atoms respectively. Using the above simple model, this deviation can be explained as the surface correction, i. e., as the effect of the escaping of energetic atoms from the surface.

• 核融合科学研究所の論文

著者

• Imada Masatoshi

  Research Information Center Institute Of Plasma Physics Nagoya University:department Of Physics Facu

• Imada Masatoshi

  Research Information Center Institute Of Plasma Physics Nagoya University:department Of Physics Facu

関連論文

• Void Lattice Formation : Spinodal Decomposition of Vacancies
• The Mass Dependence of the Sputtering Yield : Surface Correction

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