Slit-Mura Detection through Non-contact Optical Measurements of In-Line Spectrometer for TFT-LCDs

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概要

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• Slit-Mura defect is a notorious yield flaw of color filters. In this study, an innovative non-contact in-line optical inspection method is developed to detect low contrast slit Mura through quantitative measurements by a spectrometer. Using the features of either thickness or chromaticity profiles across a slit Mura, a thickness difference from 21nm to 41nm of color filters can be differentiated accurately. Thus, the quality of color filters can be accessed in-line during the manufacturing process TFT-LCDs.

• 2009-03-01

著者

• Tzu Fu-ming

  National Cheng Kung University

• CHOU Jung-Hua

  National Cheng Kung University

関連論文

• Slit-Mura Detection through Non-contact Optical Measurements of In-Line Spectrometer for TFT-LCDs

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