Oxidation Resistance of CrAlN Films with Different Microstructures Prepared by Pulsed DC Balanced Magnetron Sputtering System
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概要
- 論文の詳細を見る
- Japan Institute of Metalsの論文
- 2010-02-01
著者
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Matsuda K.
Department of Biology, Faculty of Science, Toyama University
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NOSE M.
Faculty of Science, Kyoto University
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Kawabata T.
Department Of Materials Science And Engineering Faculty Of Engineering University Of Toyama
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KHAMSEH S.
Department of Materials Science and Engineering, Faculty of Engineering, University of Toyama
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IKENO S.
Department of Materials Science and Engineering, Faculty of Engineering, University of Toyama
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Khamseh S.
Department Of Materials Science And Engineering Faculty Of Engineering University Of Toyama
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Ikeno S.
Department Of Materials Science And Engineering Faculty Of Engineering University Of Toyama
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Nose M.
Faculty Of Art And Design University Of Toyama
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