Improvement of discharge characteristics in a large area surface wave plasma processing device for chemical vapor deposition of diamond films

スポンサーリンク

概要

• 論文の詳細を見る
• 2002-08-05

著者

• Kim Jaeho

  University Of Tokyo

• Katsurai Makoto

  University Of Tokyo

関連論文

• Pulsed Power Heating of Spherical Tokamak Plasmas by Merging Process of Two Counter Helicity Compact Tori in External Toroidal Magnetic field
• The Possibility of Magnetic Relaxation in Low-Aspect-Ratio Tokamak
• Improvement of discharge characteristics in a large area surface wave plasma processing device for chemical vapor deposition of diamond films
• Experimental Study on Power Flow in Planar Type Surface Wave Plasma

スポンサーリンク