Improvement of Adhesion at the Interface between Low-k Spin-on Dielectric and underlying SiCO Barrier by Plasma Treatments

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概要

• 論文の詳細を見る
• 2007-09-19

著者

• Shiohara M.

  Semiconductor Leading Edge Technologies Inc.

• TAKIGAWA Y.

  Semiconductor Leading Edge Technologies, Inc.

• NAKAO S.

  Semiconductor Leading Edge Technologies, Inc.

• ODA N.

  Semiconductor Leading Edge Technologies, Inc.

• OGAWA S.

  Semiconductor Leading Edge Technologies, Inc.

• Takigawa Y.

  Semiconductor Leading Edge Technologies Inc.

関連論文

• Improvement of Adhesion at the Interface between Low-k Spin-on Dielectric and underlying SiCO Barrier by Plasma Treatments

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