Application of Double Polishing Pad for Shallow Trench Isolation Chemical Mechanical Polishing Process

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概要

• 論文の詳細を見る
• 2006-09-13

著者

• Seo Yong-jin

  Deptartment Of Electrical And Electronics Engineering Daebul University

• Park Sung-woo

  Deptartment Of Electrical And Electronics Engineering Daebul University

関連論文

• Application of Double Polishing Pad for Shallow Trench Isolation Chemical Mechanical Polishing Process

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