Ni(alloy)-germanosilicide contact technology for Si_<1-x>Ge_x (x=0.20-0.5) junctions

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概要

• 論文の詳細を見る
• 2006-09-13

著者

• Antoniadis D.

  Sma 4 Engineering Drive 3

• PEY K.

  SMA, 4 Engineering Drive 3

• JIN L.

  SMA, 4 Engineering Drive 3

• CHOI W.

  SMA, 4 Engineering Drive 3

• YU H.

  SMA, 4 Engineering Drive 3

• ANTONIADIS D.

  SMA, 4 Engineering Drive 3

• FITZGERALD E.

  SMA, 4 Engineering Drive 3

• CHI D.

  IMRE, 3 Research Link

• ISAACSON D.

  SMA, 4 Engineering Drive 3

• Pey K.

  Sma 4 Engineering Drive 3

• Isaacson D.

  Sma 4 Engineering Drive 3

• Fitzgerald E.

  Sma 4 Engineering Drive 3

関連論文

• Ni(alloy)-germanosilicide contact technology for Si_Ge_x (x=0.20-0.5) junctions

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