Ti-barrier Metal for Robust and Reliable 45nm Node Porous Low-k/Copper Interconnects

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概要

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2006-09-13

著者

Fujimaki T.
System Lsi Division I Semiconductor Company Toshiba Corporation
HIGASHI K.
Center for Semiconductor Research & Development, Semiconductor Company, Toshiba Corporation
YAMAGUCHI H.
Center for Semiconductor Research & Development, Semiconductor Company, Toshiba Corporation
YOSHO T.
Process & Manufacturing Engineering Center, Semiconductor Company, Toshiba Corporation
SAKATA A.
Process & Manufacturing Engineering Center, Semiconductor Company, Toshiba Corporation
OMOTO S.
Process & Manufacturing Engineering Center, Semiconductor Company, Toshiba Corporation
YAMASHITA S.
Process & Manufacturing Engineering Center, Semiconductor Company, Toshiba Corporation
ENOMOTO Y.
Semiconductor Technology Development Group, Semiconductor Business Unit, Sony Corporation
MATSUNAGA N.
Center for Semiconductor Research & Development, Semiconductor Company, Toshiba Corporation
SHIBATA H.
Center for Semiconductor Research & Development, Semiconductor Company, Toshiba Corporation
Yosho T.
Process & Manufacturing Engineering Center Semiconductor Company Toshiba Corporation

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