Buried Epitaxial, Si_<1-y>C_y (y=0.07%) for the Suppression of Leakage in SPER (550℃ 10mins) Activated Junctions and Current Drive Enhancement in nMOSFET
スポンサーリンク
概要
- 論文の詳細を見る
- 2005-09-13
著者
-
Chor Eng
Coe Ece National University Of Singapore
-
TAN Chung
COE, ECE, National University of Singapore
-
CHOR Eng
COE, ECE, National University of Singapore
-
LEE Hyeokjae
TD, Chartered Semiconductor Manufacturing
-
LIU Jinping
TD, Chartered Semiconductor Manufacturing
-
QUEK Elgin
TD, Chartered Semiconductor Manufacturing
-
CHAN Lap
TD, Chartered Semiconductor Manufacturing
-
Chan Lap
Td Chartered Semiconductor Manufacturing
-
Tan Chung
Coe Ece National University Of Singapore
-
Quek Elgin
Td Chartered Semiconductor Manufacturing
-
Liu Jinping
Td Chartered Semiconductor Manufacturing
-
Lee Hyeokjae
Td Chartered Semiconductor Manufacturing