Analysis of NiSi Fully-silicided Gate on SiO_2 and HfO_2 for CMOS Application

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概要

• 論文の詳細を見る
• 2005-09-13

著者

• Tsui Bing

  Department Of Electronics Engineering National Chiao-tung University

• Huang Chih

  Department Of Electronics Engineering National Chiao-tung University

関連論文

• Analysis of NiSi Fully-silicided Gate on SiO_2 and HfO_2 for CMOS Application

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