Effect of SiO_2 Underneath Layer on LaAlO_3 High Dielectric Constant Material for Gate Oxide Application
スポンサーリンク
概要
- 論文の詳細を見る
- 2005-09-13
著者
-
Hwang Hyunsang
Materials Science And Engineering Gwangju Institute Of Science And Technology
-
HASAN Musarrat
Materials Science and Engineering, Gwangju Institute of Science and Technology
-
Hasan Musarrat
Materials Science And Engineering Gwangju Institute Of Science And Technology