Determination of Polysilicon Gate Doping in High-κ or Oxynitride MOSFETs with Gate Electrode Fermi-Level Pinning

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概要

• 論文の詳細を見る
• 2004-09-15

著者

• Ahmed Khaled

  Front End Products Group Applied Materials Inc.

• KRAUS Philip

  Front End Products Group, Applied Materials, Inc.

• Kraus Philip

  Front End Products Group Applied Materials Inc.

関連論文

• Determination of Polysilicon Gate Doping in High-κ or Oxynitride MOSFETs with Gate Electrode Fermi-Level Pinning

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