A Wafer-Level Burn-in Technology : Realization of Stable Contact Resistance for Al Bond Pads
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概要
- 論文の詳細を見る
- 1999-09-20
著者
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Fujimoto Keiichi
Ulsi Process Technology Development Center Semiconductor Company Matsushita Electronics Corporation
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NAKATA Yoshiro
ULSI Process Technology Development Center, Semiconductor Company Matsushita Electronics Corporation
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OKI Shinichi
ULSI Process Technology Development Center, Semiconductor Company Matsushita Electronics Corporation
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WATAKABE Akio
ULSI Process Technology Development Center, Semiconductor Company Matsushita Electronics Corporation
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Oki Shinichi
Ulsi Process Technology Development Center Semiconductor Company Matsushita Electronics Corporation
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Watakabe Akio
Ulsi Process Technology Development Center Semiconductor Company Matsushita Electronics Corporation
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Nakata Yoshiro
Ulsi Process Technology Development Center Semiconductor Company Matsushita Electronics Corporation