Recent Topics in R&D of the Plasma-Based Ion Process
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概要
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The plasma-based ion implantation and deposition (PBII&D) is a powerful tool to modify surface properties of solid materials. Its application fields are extending from those in mechanical engineering in the beginning to those in nano-materials science, biomedical engineering and micro-to-nano-electronics. In the present paper, It is tried to introduce recent topics in the research and development of PBII&D from papers of the international workshop on PBII&D, Leipzig, 2007.
- 社団法人 電気学会の論文
- 2008-01-01
著者
関連論文
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- Recent Topics in R&D of the Plasma-Based Ion Process