表面分析のためのマイクロイオンビーム
スポンサーリンク
概要
- 論文の詳細を見る
Rutherford Backscattering spectrometry (RBS) and Particle Induced X-ray Emission (PIXE) are well-known techniques of ion beam analysis using MeV energy ions and they are used for material analysis like semiconductors, environmental analysis. RBS/PIXE systems are often relatively large with high energy accelerators, and are not very convenient for practical purposes. We describe here a new compact RBS/PIXE system with a small accelerator with original ion optics and beam line, which can produce a microprobe with a spot size of about 1 um.
- 2007-09-20