Plasma Properties of ICP Etching using SF_6-O_2 Gas Mixture and Their Relationship to Etching Characteristics

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概要

• 論文の詳細を見る
• 2003-12-16

著者

• Nagayasu Y.

  Fuji Electric Advanced Technology Co. Ltd

• TANAKA H.

  Fuji Electric Device Technology Co. Ltd

• ICHIKAWA Y.

  Fuji Electric Device Technology Co. Ltd

• WAKIMOTO S.

  Fuji Electric Advanced Technology Co. Ltd

• YAJIMA A.

  Fuji Electric Advanced Technology Co. Ltd

• MOCHIZUKI K.

  Fuji Electric Advanced Technology Co. Ltd

• MATSUMURA S.

  Musashi Institute of Technology

関連論文

• Plasma Properties of ICP Etching using SF_6-O_2 Gas Mixture and Their Relationship to Etching Characteristics

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