Processing of Three Dimensional Components and its Applications
スポンサーリンク
概要
- 論文の詳細を見る
The plasma-ion processing of three-dimensional components tends to expand various fields from microelectronics to environmental industries. The recent trend is not only surface modification by thin film prepared by reactive deposition using a metallic plasma source generated in reactive gases, but also deep layer ion-penetration of the component using thermal diffusion. The substrates are immersed in the plasma and are pulse-biased with a low voltage. This article introduces the plasma-ion processing for three dimensional components, and its merits and drawbacks, and examples of the applications are also shown.
- 社団法人 電気学会の論文
- 2007-01-01