Ultra-Shallow Junction Formation by Non-Melt Laser Spike Annealing and its Application to Complementary Metal Oxide Semiconductor Devices in 65-nm Node

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概要

• 論文の詳細を見る
• 2006-07-15

著者

• SHIMA Akio

  Micro Device Division, Hitachi, Ltd.

• HIRAIWA Atsushi

  Micro Device Division, Hitachi, Ltd.

• Shima Akio

  Hitachi Ltd. Tokyo Jpn

関連論文

• Ultra-Shallow Junction Formation by Non-Melt Laser Spike Annealing and its Application to Complementary Metal Oxide Semiconductor Devices in 65-nm Node

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