Formation of SiOF Films by PECVD Using (C_2H_5O)_3SiF
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概要
- 論文の詳細を見る
- 1995-08-21
著者
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Iwasawa M.
Center For Computational Science Research Center Sony Corporation
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KITO H.
Process Division, Semiconductor Company, Sony Corporation
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MUROYAMA M.
Process Division, Semiconductor Company, Sony Corporation
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SASAKI M.
Process Division, Semiconductor Company, Sony Corporation
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KIMURA H.
Center for Computational Science, Research Center, Sony Corporation
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Muroyama M.
Process Division Semiconductor Company Sony Corporation
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Kito H.
Process Division Semiconductor Company Sony Corporation