Process Integration of O_3-TEOS CVD SiO_2 for a Cover Film on Ferroelectric Capacitors
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概要
- 論文の詳細を見る
- 1996-08-26
著者
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Koyanagi K.
Ulsi Device Development Labs. Nec Corporation
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KAWAHARA J.
Microelectronics Res. Labs., NEC Corporation
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MATSUKI T.
Microelectronics Res. Labs., NEC Corporation
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KISHIMOTO K.
ULSI Device Development Labs., NEC Corporation
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HAYASHI Y.
Microelectronics Res. Labs., NEC Corporation
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Kawahara J.
Microelectronics Res. Labs. Nec Corporation
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Matsuki T.
Microelectronics Res. Labs. Nec Corporation