Silicide-Extension Technology for High-Density Embedded SRAM Cells in 0.18um-CMOS Generation and Beyond
スポンサーリンク
概要
- 論文の詳細を見る
- 1998-09-07
著者
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Tanigawa T.
Ulsi Device Development Laboratory Nec Corporation
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MATSUI K.
ULSI Device Development Laboratory, NEC Corporation
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NODA K.
ULSI Device Development Laboratory, NEC Corporation
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INOUE K.
ULSI Device Development Laboratory, NEC Corporation
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ITANI T.
ULSI Device Development Laboratory, NEC Corporation
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IWASAKI H.
ULSI Device Development Laboratory, NEC Corporation
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YOSHII T.
ULSI Device Development Laboratory, NEC Corporation
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Itani T.
Ulsi Device Development Laboratory Nec Corporation
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Yoshii T.
Ulsi Device Development Laboratory Nec Corporation