Quantitative Evaluation of Dopant Loss in Low Energy As Implantation for Low-Resistive, Ultra Shallow Source/Drain Formation

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概要

• 論文の詳細を見る
• 1998-09-07

著者

• Shibahara K.

  Rcns Hiroshima University

• KOH M.

  RCNS, Hiroshima University

• EGUSA K.

  RCNS, Hiroshima University

• FURUMOTO H.

  RCNS, Hiroshima University

• SHIBAHARA K.

  RCNS, Hiroshima University

• YOKOYAMA S.

  RCNS, Hiroshima University

• HIROSE M.

  RCNS, Hiroshima University

• Egusa K.

  Rcns Hiroshima University

• Hirose M.

  Rcns Hiroshima University

• Furumoto H.

  Rcns Hiroshima University

関連論文

• Quantitative Evaluation of Dopant Loss in Low Energy As Implantation for Low-Resistive, Ultra Shallow Source/Drain Formation
• High-Rate GaAs Epitaxial Lift-Off Technique for Optoelectronic Integrated Circuits
• Optically Interconnected Kohonen Net for Pattern Recognition

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