Characterization of Oxygen Vacancies in SrTiO_3 Thin Films by Auger Electron Spectroscopy and Its Application to Leakage Current Reduction of Ru/SrTiO_3/Ru Capacitor
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概要
- 論文の詳細を見る
- 2001-09-25
著者
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Eguchi K.
Process & Manufacturing Engineering Center Semiconductor Company Toshiba Corporation
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Nakabayashi M.
Ulsi Technology Development Division Fujitsu Limited
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NIWA S.
Process & Manufacturing Engineering Center, Semiconductor Company, Toshiba Corporation
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YAMAZAKI S.
Process & Manufacturing Engineering Center, Semiconductor Company, Toshiba Corporation
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KIYOTOSHI M.
Process & Manufacturing Engineering Center, Semiconductor Company, Toshiba Corporation
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NAKAHIRA J.
ULSI Technology Development Division, Fujitsu Limited
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CHU C.
DRAM Process Integration and Module Technology Department, Winbond Electronics Corporation
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Kiyotoshi M.
Process & Manufacturing Engineering Center Semiconductor Company Toshiba Corporation
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Niwa S.
Process & Manufacturing Engineering Center Semiconductor Company Toshiba Corporation