Spin-Drying with CO_2 Gas Purge for 0.13μm DRAM's Contact Process

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概要

論文の詳細を見る
2001-09-25

著者

TOMITA Hiroshi
Process Engineering Lab., Toshiba Corp. Semiconductor company
Okuchi Hisashi
Process Engineering Lab. Toshiba Corp. Semiconductor Company
Nadahara Soichi
Process Engineering Lab. Toshiba Corp. Semiconductor Company
Nadahara Soichi
Process & Manufacturing Engineering Center Semiconductor Company Toshiba Corporation
OGAWA Yoshihiro
Process and Manufacturing Engineering center., Toshiba Corp. Semiconductor company
MIYAZAKI Kunihiro
Process and Manufacturing Engineering center., Toshiba Corp. Semiconductor company
TAKASE Kazuhiko
Process and Manufacturing Engineering center., Toshiba Corp. Semiconductor company
Miyazaki Kunihiro
Process And Manufacturing Engineering Center. Toshiba Corp. Semiconductor Company
Takase Kazuhiko
Process And Manufacturing Engineering Center. Toshiba Corp. Semiconductor Company
Tomita Hiroshi
Process Engineering Lab. Toshiba Corp. Semiconductor Company
Ogawa Yoshihiro
Process And Manufacturing Engineering Center. Toshiba Corp. Semiconductor Company
TOMITA Hiroshi
Process and Manufacturing Engineering center., Toshiba Corp. Semiconductor company
OKUCHI Hisashi
Process and Manufacturing Engineering center., Toshiba Corp. Semiconductor company

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