CMP Using Fixed Abrasive Tool (FX-CMP) for Dielectric Planarization
スポンサーリンク
概要
- 論文の詳細を見る
- 2001-09-25
著者
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Moriyama S.
Institute Of Technologists
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KATAGIRI S.
Central Research Laboratory, Hitachi, Ltd.
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YASUI K.
Central Research Laboratory, Hitachi, Ltd.
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KAWAMURA Y.
Central Research Laboratory, Hitachi, Ltd.
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YAMAGUCHI U.
Central Research Laboratory, Hitachi, Ltd.
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NAGASAWA M.
Central Research Laboratory, Hitachi, Ltd.
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KANAI F.
Semiconductor & Integrated circuits, Hitachi, Ltd.
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KAWAI R.
Manufacturing Engineering & Environmental Policy Department, Hitachi, Ltd.
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TOKUDA M.
Instruments, Hitachi, Ltd.
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YAMADA N.
Nihon Tokushu Kento co., Ltd.
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Tokuda M.
Instruments Hitachi Ltd.