Osmium-metal coating device using hollow-cathode plasma CVD method
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概要
- 論文の詳細を見る
- Published for the Japanese Society of Electron Microscopy by Oxford University Pressの論文
- 2000-12-01
著者
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Akahori Hiroshi
Vacuum Device Inc.
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Kozuka Yoshimichi
National Institute Of Neuroscience Ncnp
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YOSHIDA Hisaharu
Vacuum Device Inc.
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HANDA Matsuo
Vacuum Device Inc.
関連論文
- Studies on the SEM examination of un-coated non-conductive specimens prepared by plasma-ion shower method
- Osmium-metal coating device using hollow-cathode plasma CVD method