Osmium-metal coating device using hollow-cathode plasma CVD method

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概要

• 論文の詳細を見る
• Published for the Japanese Society of Electron Microscopy by Oxford University Pressの論文
• 2000-12-01

著者

• Akahori Hiroshi

  Vacuum Device Inc.

• Kozuka Yoshimichi

  National Institute Of Neuroscience Ncnp

• YOSHIDA Hisaharu

  Vacuum Device Inc.

• HANDA Matsuo

  Vacuum Device Inc.

関連論文

• Studies on the SEM examination of un-coated non-conductive specimens prepared by plasma-ion shower method
• Osmium-metal coating device using hollow-cathode plasma CVD method

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