Metastable Ion Study of Organosilicon Compounds. Part XII. 2-Propoxytrimethylsilane, (CH_3)_3SiOCH(CH_3)_2
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概要
- 論文の詳細を見る
Unimolecular decomposition of 2-propoxytrimethylsilane, (CH3)3SiOCH(CH3)2 (Mw: 132, 1), upon electron impact ionization, has been studied by use of mass-analyzed ion kinetic energy (MIKE) spectrometry and D-labeling technique. The abundance of the molecular ion of 1 is too low to measure the MIKE spectrum. A methyl radical loss occurs from two different groups in 1+.; i.e., from either trimethylsilyl group or 2-propyl group. The ion at m/z 117 formed via the latter reaction decomposes into the m/z 73 ion, trimethylsilyl ion, by the loss of acetaldehyde, whereas the ion via the former reaction decomposes exclusively into the m/z 75 ion, hydroxydimethylsilyl ion, by the loss of propene. The methyl loss from the trimethylsilyl group prevails over that from the 2-propyl one.
- 日本質量分析学会の論文
- 2000-02-01
著者
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Tajima S
Gunma National Coll. Of Technol. Gunma Jpn
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Tajima S
Gunma Coll. Technology Gunma Jpn
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Tajima Susumu
Chemistry And Materials Science Gunma National College Of Technology
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Sekiguchi O
Chemistry And Mateirials Science Gunma National College Of Technology
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Nakajima Satoshi
Chemistry And Materials Science Gunma National College Of Technology
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SEKIGUCHI Osamu
Chemistry and Mateirials Science, Gunma National College of Technology
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FUJIZUKA Atsuyo
Chemistry and Materials Science, Gunma National College of Technology
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Tajima Susumu
Chemistry And Material Science Gunma National College Of Technology
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Fujizuka Atsuyo
Chemistry And Materials Science Gunma National College Of Technology
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Nakajima Satoshi
Chemistry And Material Science Gunma National College Of Technology
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Fujizuka Atsuo
Chemistry and Materials Science, Gunma National College of Technology
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Tajima Susumu
Chemistry and Mateirials Science, Gunma National College of Technology
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Nakajima Satoshi
Chemistry and Mateirials Science, Gunma National College of Technology
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