TUNNELING REACTION OF H ATOMS WITH SILANE THIN FILM AT CRYOGENIC TEMPERATURE : FROMATION OF THIN-FILM SEMICONDUCTOR
スポンサーリンク
概要
- 論文の詳細を見る
- 2001-12-15
著者
-
Hishiki S.
Clean Energy Research Center Ymamanashi University
-
SATO T.
Clean Energy Research Center, Ymamanashi University
-
SATO S.
Clean Energy Research Center, Ymamanashi University
-
SUZUKI K.
Clean Energy Research Center, Ymamanashi University
-
TAKAHASHI Y.
Clean Energy Research Center, Ymamanashi University
-
YOKOYAMA T.
Clean Energy Research Center, Ymamanashi University
-
KITAGAWA S.
Clean Energy Research Center, Ymamanashi University
-
HIRAOKA K.
Clean Energy Research Center, Ymamanashi University