Electrochemical Studies on [UO_2(DMF)_5](ClO_4)_2, UO_2(acac)_2DMF, and UO_2(salen)DMF (DMF=N,N-dimethylformamide, acac=acetylacetonate, salen=N,N'-disalicylideneethylenediaminate) Complexes in DMF
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概要
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Electrochemical studies on [UO2(DMF)5]2+, UO2(acac)2DMF, and UO2(salen)DMF (DMF=N,N-dimethylformamide, acac=acethylacetonate, and salen=N,N′-disalicylidene-ethylenediaminate) complexes in DMF containing tetrabutylammonium perchlorate as supporting electrolyte have been carried out by using cyclic voltammetry to compare the stabilities of the reduction products of U(VI) complexes with unidentate or multidentate ligands. The [UO2(DMF)5]2+, UO2(acac)2DMF, and UO2(salen)DMF complexes were found to be quasi-reversibly reduced to U(V) species. The formal redox potentials (Eo, vs. ferrocene/ferrocenium) for the U(VI)/U(V) couple were determined to be −0.89 V for [UO2(DMF)5]2+, −1.47 V for UO2(acac)2DMF, and −1.67 V for UO2(salen)DMF. The U(V) species formed in the reduction of [UO2(DMF)5]2+ complex is not stable and further reduced to UO2, while those generated in the reduction of UO2(acac)2DMF and UO2(salen)DMF complexes can exist stably in DMF.
- 社団法人 日本原子力学会の論文
- 2002-02-25
著者
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Kim Seong-yun
Japan Atomic Energy Agency
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Ikeda Yujiro
Japan Atomic Energy Research Institue
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Kim Seong-yun
Research Laboratory For Nuclear Reactors Tokyo Institute Of Technology
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IKEDA Yasuhisa
Research Laboratory for Nuclear Reactors, Tokyo Institute of Technology
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TOMIYASU Hiroshi
Shinshu University
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TOMIYASU Hiroshi
Department of Chemistry and Material Engineering, Shinshu University
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Ikeda Y
Research Laboratory For Nuclear Reactors Tokyo Institute Of Technology
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Ikeda Yasuhisa
Research Laboratory For Nuclear Reactors Tokyo Institute Of Technology
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Ikeda Yasuhisa
Res. Lab. For Nuclear Reactors Tokyo Inst. Of Technol.
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Tomiyasu H
Department Of Chemistry And Material Engineering Shinsyu University
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Tomiyasu Hiroshi
Department Of Chemistry And Material Engineering Faculty Of Engineering Shinshu University
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Tomiyasu Hiroshi
Research Laboratory For Nuclear Reactors Tokyo Institute Of Technology
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