Mechanism of the Production of Concentric Spread Plasma
スポンサーリンク
概要
- 論文の詳細を見る
- Publication Office, Japanese Journal of Applied Physics, Faculty of Science, University of Tokyoの論文
- 2001-02-01
著者
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WATANABE Seiichi
R&D center, Kasado Administrative Division Power & Industrial Systems, Hitachi Ltd.
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Watanabe Seiichi
R&d Center Kasado Administrative Division Power & Industrial Systems
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SUMITA Masahiro
R&D Center, Kasado Administrative Division, Power & Industrial Systems
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Sumita Masahiro
R&d Center Kasado Administrative Division Power & Industrial Systems
関連論文
- Mechanism of the Reduction of Electron Shading Charge Build-up Using Pulsed Plasma
- High-Frequency Measurements of Plasma Parameters in Electron Cyclotron Resonance Plasma Etchers(Nuclear Science, Plasmas, and Electric Discharges)
- Mechanism of the Production of Concentric Spread Plasma
- Energy Control of Incident Ions to the Chamber-Wall by Using Push–Pull Bias (Phase-Controlled Bias) in UHF-ECR Etching System