Structural Changes in a Resist Resulting from Plasma Exposure during the Reactive Ion Etching Process
スポンサーリンク
概要
- 論文の詳細を見る
- Publication Office, Japanese Journal of Applied Physics, Faculty of Science, University of Tokyoの論文
- 2001-02-01
著者
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Omiya Kayoko
Process Research Center Corporate Manufacturing Engineering Center Toshiba Corporation
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Tohno Ichiro
Process Research Center Corporate Manufacturing Engineering Center Toshiba Corporation
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SAITO Makoto
Process Research Center, Corporate Manufacturing Engineering Center, Toshiba Corporation
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KATAOKA Yoshinori
Process Research Center, Corporate Manufacturing Engineering Center, Toshiba Corporation
関連論文
- Structural Changes in a Resist Resulting from Plasma Exposure during the Reactive Ion Etching Process
- Structural Changes in a Resist Resulting from Plasma Exposure during the Reactive Ion Etching Process