CVD Process Simulation for TiN, Mo. Film Growth Rate Distributions
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概要
- 論文の詳細を見る
- Japan Institute of Metalsの論文
- 1999-11-20
著者
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Yoshikawa Noboru
School Of Metallurgy Division Of Engineering Graduate Schools Tohoku University
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TANIGUCHI Shoji
School of Metallurgy, Division of Engineering, Grauate Schools Tohoku University
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KIKUCHI Atsushi
School of Metallurgy, Division of Engineering, Graduate Schools Tohoku University
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Taniguchi Shoji
School Of Metallurgy Division Of Engineering Graduate Schools Tohoku University
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Kikuchi Atsushi
School Of Metallurgy Division Of Engineering Graduate Schools Tohoku University
関連論文
- Microstructures of Al/Al_2 O_3 Composite Bodies Obtained by Reaction between SiO _2 and Molten Al at Temperatures Ranging from 1073 to 1473K
- CVD Process Simulation for TiN, Mo. Film Growth Rate Distributions