EMISSION INTENSITY OF THE RESONANCE LINE OF Al ATOM SPUTTERED FROM AN OXYGEN COVERED Al SURFACE BY Ar^+ BOMBARDMENT
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概要
- 論文の詳細を見る
- 1999-11-20
著者
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Tsurubuchi S.
Department Of Applied Physics Faculty Of Technology Tokyo University Of Agriculture And Technology
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WADA R.
Department of Applied Physics, Faculty of Technology, Tokyo University of Agriculture and Technology
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NIMURA T.
Kawasaki Microelectronics, Inc
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NIMURA T.
Department of Applied Physics, Faculty of Technology, Tokyo University of Agriculture and Technology
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Tsurubuchi S.
Department Of Applied Physics Fucalty Of Technology Tokyo University Of Agriculture And Technology
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Nimura T.
Kawasaki Microelectronics Inc
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TSURUBUCHI S.
Department of Applied Physics, Faculty of Technology, Tokyo University of Agriculture and Technology
関連論文
- EFFECT OF ADSORBED OXYGEN IN MULTIPLY CHARGED ION-METAL SURFACE INTERACTIONS
- DISSOCIATIVE ELECTRON TRANSFER PROCESSES IN Ar^+N_2 AND Ar^+CF_4
- SECONDARY-ELECTRON EMISSION IN ION-SURFACE INTERACTIONS : EFFECT OF SURFACE OXYGEN COVERAGE
- SECONDARY-ION YIELD FROM SOLID SURFACES BY ION BOMBARDMENT : EFFECT OF SURFACE-OXYGEN COVERAGE
- DEPENDENCE OF SECONDARY ELECTRON YIELD ON SURFACE OXYGEN COVERAGE OF AN AI TARGET UNDER Ar^+ BOMBARDMENT
- DYNAMICS OF LIGHT EMISSION FROM SPUTTERED ATOMS
- MESUREMENTS OF MEAN VELOCITY OF SPUTTERED Al ATOMS BY Ar^+ BOMBARDMENT FROM Al SURFACE
- EMISSION INTENSITY OF THE RESONANCE LINE OF Al ATOM SPUTTERED FROM AN OXYGEN COVERED Al SURFACE BY Ar^+ BOMBARDMENT
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