A Method for Identifying Sources of Reactive Ion Etch Lag and Loading in a Magnetically Enhanced Reactive Ion Etcher

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概要

• 論文の詳細を見る
• Publication Office, Japanese Journal of Applied Physics, Faculty of Science, University of Tokyoの論文
• 1997-07-01

著者

• Ventzek Peter

  Hokkaido University Department Of Electrical Engineering

• Pender Jeremiah

  Applied Materials

• BUIE Melisa

  Applied Materials

関連論文

• A Method for Identifying Sources of Reactive Ion Etch Lag and Loading in a Magnetically Enhanced Reactive Ion Etcher

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