Numerical Simulation of Etching and Deposition Processes

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概要

• 論文の詳細を見る
• Publication Office, Japanese Journal of Applied Physics, Faculty of Science, University of Tokyoの論文
• 1997-07-01

著者

• Wang C

  Shandong Univ. Jinan Chn

• HAMAGUCHI Satoshi

  IBM Thomas J.Watson Research Center

• MAYO Anita

  IBM Thomas J.Watson Research Center

• ROSSNAGEL Stephen

  IBM Thomas J.Watson Research Center

• KOTECKI David

  IBM Microelectronics Division

• MILKOVE Keith

  IBM Thomas J.Watson Research Center

• WANG Cindy

  IBM Microelectronics Division

• FARRELL Curtis.E.

  IBM Thomas J.Watson Research Center

関連論文

• Crystal Growth, Thermal and Laser Properties of Neodymium-doped Strontium Fluorapatite
• Laser Properties at 1.06 μm for Nd:GdVO_4 Single Crystal Pumped by a High Power Laser Diode
• Observation of the Vortex-Glass Transition in the Tl-Based Superconducting Thin Films
• Flux Line Dynamics Crossover in the Tl-Ba-Ca-Cu-O Thin Film
• Numerical Simulation of Etching and Deposition Processes
• Numerical Simulation of Etching and Deposition Processes

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