Formatin of SiOF Films by Plasma-Enhanced Chemical Vapor Deposition Using (C_2H_5O)_3SiF
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概要
- 論文の詳細を見る
- 1996-02-01
著者
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Kitoh Hideyuki
Mos Lsi Division Semiconductor Company Sony Corporation
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Muroyama Masakazu
Mos Lsi Division Semiconductor Company Sony Corporation
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SASAKI Masayoshi
MOS LSI Division, Semiconductor Company, Sony Corporation
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IWASAWA Misako
Center for Computational Science, Research Center, Sony Corporation
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KIMURA Hitoshi
Center for Computational Science, Research Center, Sony Corporation
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Iwasawa Misako
Center For Computational Science Research Center Sony Corporation
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Sasaki Masayoshi
Mos Lsi Division Semiconductor Company Sony Corporation
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Kimura Hitoshi
Center For Computational Science Research Center Sony Corporation