CULTIVAR DIFFERENCE IN CPD PHOTOREPAIR BETWEEN UV-RESISTANT AND-SENSITIVE RICE
スポンサーリンク
概要
著者
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Sutherland Betsy
Dept. Biol. Brookhaven Natl. Lab.
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Sutherland John
Dept. Biol. Brookhaven Natl. Lab.
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HIDEMA Jun
Inst. Gen. Ecol., Tohoku Univ.
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KUMAGAI Tadashi
Inst. Gen. Ecol. Tohoku Univ.
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Hidema Jun
Inst. Gen. Ecol. Tohoku Univ.
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Hidema Jun
Genetic Ecology Tohoku Univ.
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Kumagai Tadashi
Genetic Ecology Tohoku Univ.
関連論文
- CYCLOBUTYL PYRIMIDINE DIMER (CPD) PHOTOREPAIR IN CRUDE EXTRACT OF RICE LEAVES
- CULTIVAR DIFFERENCE IN CPD PHOTOREPAIR BETWEEN UV-RESISTANT AND-SENSITIVE RICE
- DNA REPAIR DEFICIENCIE SIN UVB-SENSITIVERICE
- MONOCHROMATIC UV RADIATION (302 NM)INDUCED DNA DAMAGES AND PHOTOREPAIR IN RICE SEEDLINGS
- UVB-INDUCED DNA DAMAGE AND REPAIR IN RICE
- EFFECTS OF UVB RADIATION ON SYNTHESIS AND DEGRADATION OF RUBISCO AND LHCII IN RICE LEAVES
- Photocontrol of induction of photorepair of UVB-induced DNA damages in rice (Oryza sativa L.)
- EFFECTS OF LIGHT ENVIRONMENT DURING CULTURE ON UV-INDUCED CPD AND ITS PHOTOREPAIR IN RICE
- EFFECTS OF ELEVATED UV-B RADIATION ONGROWTH AND RUBISCO CONTENT IN LEAF OF RICE (Oryza Sativa L.).
- CHANGES IN UVB-INDUCED DNA DAMAGE AND ITS REPAIR WITH PROGRESS OF LEAF AGE IN RICE PLANT
- PHOTO-CONTROL OF INDUCTION OF CPD PHOTOREPAIR IN RICE (Oryza sativa L. )