Formation of Silicon Nitride Thin Films by RF Ion Plating and Their Properties

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概要

• 論文の詳細を見る

著者

• Inoue Takahiro

  Nagasaki Institute Of Applied Science

• Daikoku Takashi

  Nagasaki Institute Of Applied Science

• KANEMOTO Norikazu

  Nagasaki Institute of Applied Science

• BABA Komei

  Technology Center of Nagasaki

関連論文

• Wear Property of Sulfurizing and : Liquid Nitriding Treatment
• Formation of Silicon Nitride Thin Films by RF Ion Plating and Their Properties

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