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the ULSI Laboratories, Research and Development Center, TOSHIBA CORPORATION | 論文
- Monte Carlo Analysis of Velocity Overshoot Effects in Bipolar Devices with and without an i-Layer (Special Issue on 1993 VLSI Process and Device Modeling Workshop (VPAD93))
- Mechanical Stress Analysis of Trench Isolation Using a Two-Dimensional Simulation (Special Issue on 1993 VLSI Process and Device Modeling Workshop (VPAD93))