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ULSI Research Laboratory, Microelectronics Research Laboratories, NEC Corporation | 論文
- Nitride-Masked Polishing (NMP) Technique for Surface Planarization of Interlayer-Dielectric Films
- Ammonium-Salt-Added Silica Slurry for the Chemical Mechanical Polishing of the Interlayer Dielectric Film Planarization in ULSI's
- Effect of Thermal Data-Imprint on 2T/2C FeRAM Cell Operation