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Toray Research Center, Inc., Otsu 520-8567, Japan | 論文
- Grain Growth Enhancement of Electroplated Copper Film by Supercritical Annealing
- Current Induced Grain Growth of Electroplated Copper Film (Special Issue : Advanced Metallization for ULSI Applications)
- Microscopic Degradation Mechanisms in Silicon Photovoltaic Module under Long-Term Environmental Exposure
- Impact of Thermally Induced Structural Changes on the Electrical Properties of TiN/HfLaSiO Gate Stacks
- Three-Dimensional Dopant Characterization of Actual Metal--Oxide--Semiconductor Devices of 65 nm Node by Atom Probe Tomography
- Three-Dimensional Dopant Characterization of Actual Metal-Oxide-Semiconductor Devices of 65 nm Node by Atom Probe Tomography