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School of Electrical Engineering, Kookmin University, Seoul 136-702, Korea | 論文
- Impact of High-$k$ HfO2 Dielectric on the Low-Frequency Noise Behaviors in Amorphous InGaZnO Thin Film Transistors
- AC Stress-Induced Degradation of Amorphous InGaZnO Thin Film Transistor Inverter