スポンサーリンク
Institute of Fluid Science, Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai 980-8557, Japan | 論文
- Fabrication of a Vertical-Channel Double-Gate Metal–Oxide–Semiconductor Field-Effect Transistor Using a Neutral Beam Etching
- New Fabrication Technology of Fin Field Effect Transistors Using Neutral-Beam Etching