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Ibaraki Electrical Communication Laboratory, Nippon Telegraph and Telephone Corporation | 論文
- Threshold Gas Flow Rate of Halide Materials for the Formation of Oxide Particles in the VAD Process for Optical Fiber Fabrication
- Deposition Properties of High-Silica Particles in the Flame Hydrolysis Reaction for Optical Fiber Fabrication
- Deposition Properties of SiO_2-GeO_2 Particles in the Flame Hydrolysis Reaction for Optical Fiber Fabrication
- Structural Properties of GeO_2 Particles Used for Optical Fiber Fabrication
- Silica Glass Optical Waveguide by Liquid-Phase Doping Process
- Nondestructive Structure Measurement of Optical-Fiber Preforms with Photoelastic Effect
- Possibility of Use of Liquid Crystals as Optical Waveguide Material for 1.3 μm and 1.55 μm Bands